Description
- High aspect-ratio Fresnel zone plates
- Best achievable resolution
- Great efficiency available across a wide energy range (50 eV - 20 keV)
- Outstanding freedom of material choices (Au, Ni, Si, SiO2, Ir, Cr, Diamond)
Example

Electroplated gold zone plate for multi-keV X-rays with 50 nm wide and 500 nm high structures (left and center). Nickel zone plate for soft X-rays with 25 nm outermost zone width (right)
Specifications
∆Rn [nm]
typical
50 - 100
limit
< 10
D [µm]
typical
100 - 500
limit
> 4.500
N
typical
1.000 - 3.000
limit
> 30.000
Aspect Ratio
typical
10
limit
> 30
Publications
S. Gorelick et al. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating Nanotechnology 21 (2010) p. 295303
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S. Gorelick et al. Direct e-beam writing of high aspect ratio nanostructures in PMMA: a tool for diffractive x-ray optics fabrication Microelectronic Engineering 87 (2010) p. 1052
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S. Gorelick et al. High efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating Journal of Synchrotron Radiation 18 (2011) p. 442
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K. Jefimovs et al. Beamshaping Condenser Lenses for Full-Field Transmission X-ray Microscopy Journal of Synchrotron Radiation 15 (2008) p. 106