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Description

- High aspect-ratio Fresnel zone plates

- Best achievable resolution

- Great efficiency available across a wide energy range (50 eV - 20 keV)

- Outstanding freedom of material choices (Au, Ni, Si, SiO2, Ir, Cr, Diamond)

Example

Fresnel Zone plate and nano structures

Electroplated gold zone plate for multi-keV X-rays with 50 nm wide and 500 nm high structures (left and center). Nickel zone plate for soft X-rays with 25 nm outermost zone width (right)

Specifications

∆Rn [nm]

typical

50 - 100

limit

< 10

D [µm]

typical

100 - 500

limit

> 4.500

N

typical

1.000 - 3.000

limit

> 30.000

Aspect Ratio

typical

10

limit

> 30

Publications

S. Gorelick et al. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating Nanotechnology 21 (2010) p. 295303

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S. Gorelick et al. Direct e-beam writing of high aspect ratio nanostructures in PMMA: a tool for diffractive x-ray optics fabrication Microelectronic Engineering 87 (2010) p. 1052

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S. Gorelick et al. High efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating Journal of Synchrotron Radiation 18 (2011) p. 442

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K. Jefimovs et al. Beamshaping Condenser Lenses for Full-Field Transmission X-ray Microscopy Journal of Synchrotron Radiation 15 (2008) p. 106

Fresnel zone plates

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