Nanoscale X-ray optics
with Swiss precision
01 / HIGH RESOLUTION
We achieve ultra-high resolutions by using a unique line doubling technique. This allows beating the smallest-size limit, which is currently accessible with electron-beam lithography by a factor of two.
02 / HIGH EFFICIENCY
We meet the need for a maximal amount of photons in the focus by fabricating blazed optics. With this technique, we overcome the theoretical efficiency limit of binary optics.
03 / HIGH STABILITY
We are able to fabricate X-ray optics from monolithic diamond by using state-of-the-art reactive ion etching techniques. These optics are especially suitable for Free Electron Laser applications, because they withstand high beam intensities.
04 / HIGH FLEXIBILITY
We continuously develop new processing technologies with which we can manufacture nanostructures from a wide range of materials. This enables us to address applications in a wide range of X-ray energies.
05 / HIGH VARIETY
We create unique and innovative optical designs for new classes of experiments. Custom designs can be implemented on the nanoscale.
06 / HIGH DIVERSITY
We enable cutting-edge experiments in the research fields of healthcare, electronics, materials, biology and beyond by providing innovative X-ray optical solutions.
XRnanotech offers unique solutions
for X-ray optics applications
Our vision: We envision to enable beamlines around the world to reach their full potential.
Our mission: We seek to develop the most innovative X-ray optics aiming for highest quality in resolution, efficiency, stability and design.
XRnanotech won the «PSI Founder Fellowship», which is the leading initiative to start spin-offs from Paul Scherrer Institut. Recently, we were awarded the title «Deep Tech Pioneer», from over 5000 applications from 128 countries.