Products

XRnanotech manufactures the world’s most advanced nanostructures and optics for a wide range of X-ray and extreme ultraviolet applications.

Standard, high aspect-ratio and blazed zone plates from an ample choice of materials, manufactured with electron beam lithography

Diffractive gratings for beam splitting, phase contrast imaging or grating interferometry

Zone plates, gratings and optics made of diamond for high intensity applications, e.g. at free electron lasers

Strong refractive power and finely adjustable working distances for compound refractive lenses and prism lenses

Novel achromatic lens systems allow for a broad usage of X-ray radiation

Free design of optics for unique applications like beam splitting, focusing or orbital angular momentum

Calibration test targets for micro CT applications

Standard or custom resolution test patterns with state-of-the-art accuracy

Full field transmission X-ray microscope optics, set of condensers, zone plates and zernike phase rings

Created with high-Z materials through deep reactive ion etching and grayscale lithography with direct laser writing

Custom 3D-printed structures, e.g. phase corrector plates, kinoform lenses and arrays or resolution test targets

Custom photonics and chip fabrication for cutting-edge optical applications

Replicable 2.5-D microoptical elements with grayscale resist topography and shape fidelity

Membranes supported by frames all with flexible dimensions engineered for optical and industrial use

Improved performance across EUV and X-ray systems

Improved performance across EUV and X-ray systems

high-performance components tailored for horology

Engineered for Talbot–Lau and edge illumination imaging, in collaboration with Microworks.

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