Micro CT Test Targets
Electron-beam lithography-based fabrication with optimized writing strategy.
- Calibration standards
- Resolution test targets
- Fast Lead time
- Material choices: Au, Ir
- Holder mounted
Micro-CT test targets are precision-engineered to provide high contrast imaging with superior resolution. Fabricated using electron-beam lithography on thin Si₃N₄ membranes, these targets allow for exceptional clarity, even without a silicon substrate. We specialize in producing intricate gold nanostructures with a feature size of just 10 nm with matched accuracy. Our optimized processes enable us to scale production from small batches to larger volumes. These features make our test targets ideal for advanced imaging applications.
Specifications
| Smallest Features / nm | Area, A / mm2 | |
| typical | 50 | 1 |
| standard limit | 10 | 3 |
| Aspect Ratio | |
| typical | 10 ∶ 1 |
| standard limit | > 30 ∶ 1 |
| Standard Targets |
| Critical Feature Size / nm | Height / μm |
| 100 | 1 |
| 200 | 1.5 |
| 300 | 4 |
| 400 | 4 |
Prices per piece with volume discounts applicable.
We will get in touch with you usually until the next business day.