Photo of the inside of the cleanroom at ParkInnovaare, named the Park Innovaare Cleanroom for Optics and innovation with the acronym, PICO.

Technology

XRnanotech implements the newest innovations in X-ray optics research and development, pushing the boundaries of what is possible and enabling customers worldwide to utilize these possibilities. The patented technologies together with the engineering prowess of our team and our highest-level quality-control, make for the most advanced X-ray optics in the world.

Scanning electron microscope image of a tilted resolution test target.

Lithography

Lithography is our specialty within our 1000 m² state-of-the-art clean room. Using advanced electron and photon beam techniques, we achieve precise patterning for advanced optics, high-resolution test targets, and customizable 2D and 3D structures. Our high aspect ratio capabilities enhance device performance at the nanometer scale while ensuring structural integrity and reproducibility. We deliver efficient and compact devices, driving innovation in technology and materials science.

Micro CT Test Targets

Photograph of the DWL 66’ instrument, the direct laser writer located in the cleanroom at XRnanotech.

Direct Laser Writing

Our go-to tool for greyscale lithography is our direct laser writer, DWL 66’, with high-resolution direct-write pattern generation. Ideal for R&D, this versatile system excels in microstructure fabrication across various applications such as blazed gratings and intricate 2.5D microstructures, such as micro-optics. We use this for for exceptional quality and customization in microelectronic, MEMS, microfluidic, and sensor projects.

Blazed Gratings and Greyscale Structures

Hartmann Wavefront Sensor Systems

Microscope image of a zone plate made with electron beam lithography.

Electron Beam Lithography

Our in-house work horse is a highly versatile electron beam direct writer (Raith  EBPG  5000Plus) for maskless lithography, offering exceptional precision and flexibility in patterning various substrates with a wide range of materials, with products such as Fresnel zone plates shown. It operates in a controlled environment to ensure optimal performance and is equipped with advanced features for achieving high-resolution patterns.

Fresnel zone plates

Scanning electron microscope image of a three dimensional structure using direct writing.

Two Photon Polymerization for 3D structures

Our high-speed, high-precision 3D printing capabilities span nano to mesoscale dimensions, ensuring unparalleled design freedom and quality. Using a state-of-the-art scientific 3D printer (Nanoscribe GT+) two-photon polymerization creates ultra-precise structures with submicron resolution, enabling the fabrication of complex geometries, crystal lattices, porous scaffolds, and more. Contact us for cutting-edge 3D products, such as 3D siemens stars, that meet the highest standards of precision and excellence.

3D Nanostructures

Photo of a mask aligner for photolithography in the cleanroom at XRnanotech.

Ultraviolet Mask Aligner

Photolithography is a main tool when speed, high throughput and cost-effectiveness are paramount. When paired with a mask, our two aligners (SUSS MA8-BA6 and SUSS MA6-BA6) as pictured offer ideal patterning over large areas quickly, which is crucial for manufacturing processes where entire wafers are exposed in a single step used for making membranes, for example.

Membranes

Microscope image of periodic structures etched into silicon.

Displacement Talbot Lithography

We utilize cutting-edge Displacement Talbot Lithography (DTL) technology to create superior products. Periodic structures are patterned with resolutions down to 300 nm on wafer scales up to 8 inches, surpassing standard photolithography. This tool (Phable R200) offers high resolution, exceptional depth of focus, and flawless patterning free from stitching errors. With DTL, we develop groundbreaking optical components and advanced structures for various applications, gratings, lenses and overall beamline supply. Trust us to deliver the highest quality, precision-engineered products using the latest in lithography technology.

Beamline Supplies, Apertures and Central Stops

Wet Chemistry

We excel in wet chemistry procedures such as developing, acid and alkali etching, and sample processing, integral to producing high-quality products in our cleanroom such as gratings. Our extensive experience is crucial for achieving the precision and reliability required in microfabrication as each process is meticulously executed to meet the highest standards. This proficiency allows us to deliver consistent, top-tier results for our clients’ advanced technological applications. Photograph by M. Teller.

X-ray Gratings and Beam Splitters

Electron microscope image of grating made using etching.

Etching

We have a comprehensive suite of advanced etching tools at our disposal to achieve precise microstructure fabrication, including the Sentech ICP RIE and the Rapier Omega LPX Deep Reactive Ion Etcher, among others. We specialize in creating complex structures and etching new materials for EUV optics, among other products with high resolution, smooth sidewalls and superior selectivity. We guarantee cutting-edge microfabrication like never before with our top-tier etching capabilities.

X-ray Gratings and Beam Splitters

Diamond Optics

Metal Assisted Chemical Etching (MACE)

MACE is revolutionizing nanofabrication in our cleanroom, especially for creating high-aspect-ratio structures like nanowires pictured here and precision optics such as zone plates and gratings. This innovative technique leverages the simplicity and low cost of chemical etching, combined with the precision of metal catalysts, to achieve intricate nanoscale features that traditional methods struggle to produce. Our mastery of MACE is central to pushing the boundaries of nanotechnology and enhancing the capabilities of various high-tech applications.

Fresnel Zone Plates

X-ray Gratings and Beam Splitters

Scanning electron microscope image of a zone plate holding the record of the smallest feature size of 7 nanometers fabricated by team members of XRnanotech.
Picosun ALD

Deposition, Plating and Coating

Advanced deposition, plating, and coating techniques are essential for high-quality cleanroom production. We utilize benchtop systems and high-tech instrumentation, such as Evatec BAK Evaporators, to achieve precise thin film deposition with unparalleled accuracy. Our precision execution of these challenging procedures is evident in our top-tier, record-breaking results for complex 2D and 3D structures as seen in our high resolution zone plates with a 7 nm feature size.

Fresnel Zone Plates

Micro CT Test Targets

High profile map of a blazed zone plate.

Electron microscopy and metrology

Precise inspection and quality assurance are paramount in cleanroom production. Our advanced Electron Microscopy and Metrology suite, featuring state-of-the-art instruments like the Zeiss Supra 55VP and Hitachi Regulus 8230 scanning electron microscopes, ensures meticulous sample inspection with variable pressure and EDX capabilities. Complemented by optical profilers, we guarantee the highest standards of accuracy and reliability in our inspection processes, for example, blazed zone plate pitch and sidewall profiles depicted. Our commitment to precision is reflected in the superior quality of every product we deliver.

Blazed Gratings and Greyscale Structures

Selected Sources

XRnanotech AG Product Brochure: Nanostructures & Optics with Swiss Precision (2022) XRnanotech AG Technology Brochure: Nanostructures & Optics with Swiss Precision (2022)

A. Kubec and F. Döring. XRnanotech – Recent Developments In Nanostructured X-ray And EUV Optics. Optica High-brightness Sources and Light-driven Interactions Congress (2022)

K. Jefimovs and M. Stampanoni. Displacement Talbot Lithography for micro and nanopatterning. SNF  R’Equip  grant  Nr.  206021_177036 (2017)

K. Jefimovs. Advanced Si DRIE tool for highlY uniform ultra-deep structuring (SiDRY). SNF  R’Equip  grant  Nr. 206021_189662 (2019)

B. Rösner et al. Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses Microelectronic Engineering, 191, doi: 10.1016/j.mee.2018.01.033 (2018)

B. Rösner et al. 7 nm spatial resolution in soft x-ray microscopy. Microscopy and Microanalysis. 24 (2018)

K. Jefimovs et al. A zone doubling technique to produce ultra-high resolution X-ray optics. Physical Review Letters, 99 (2007)

J. Vila-Comamala et al. Advanced thin film technology for ultrahigh resolution X-ray microscopy. Ultramicroscopy, 109 (2009)

P. Karvinen et al. Kinoform diffractive lenses for efficient nano-focusing of hard X-rays. Optics Express 22 (2014)

I. Mohacsi et al. High efficiency X-ray nanofocusing by multilevel zone plates. Journal of Synchrotron Radiation, 21 (2014)

I. Mohacsi et al. Fabrication and characterization of high efficiency double-sided blazed X-ray optics. Optics Letters, 41 (2016)

C. David et al. Nanofocusing of hard X-ray free electron laser pulses using diamond based Fresnel zone plates. Scientific Reports, 1 (2011)

M. Makita et al. Diamond diffraction gratings for experiments with intense hard X-rays. Microelectronic Engineering, 176 (2017)

N. Kujala et al. Characterizing transmissive diamond gratings as beam splitter for hard X-ray singleshot spectrometer of European XFEL. Journal of Synchrotron Radiation, 26 (2019)

Discover More Products Our Customers Appreciate

X-ray and EUV Optics

A scanning electron microscope image of a fresnel zone plate optic for diffractive focusing of X-rays.

Fresnel Zone Plates

High aspect ratio with the best achievable resolution.

Fresnel Zone Plates

A scanning electron microscope image of a diffractive grating for beam splitting, interferometry and phase contrast imaging.

Gratings and Beam Splitters

Designed for customer needs using various fabrication approaches.

X-ray Gratings and Beam Splitters

Two electron microscopy images of a condenser lens incorporated into a complete X-ray imaging setup. The left is a full picture and the right is a zoomed in image.

X-ray Microscopy Setups

Complete sets of optical components for full field or scanning X-ray microscopes.

Phase Contrast Imaging

Atomic force microscopy images of blazed gratings.

Blazed Gratings

Superior performance in diverse optical systems having choice grove density and high performance. © Paul Scherrer Institite.

Blazed Gratings and Greyscale Structures

A scanning electron microscope image of a defocusing refractive lens, part of an achromatic X-ray lens system.

Achromatic X-ray Lenses

3D nanoprinting allowing unique nanostructures and X-ray optics.

Achromatic X-ray Lenses

Microscope image of phase rings for an X-ray imaging system.

Phase Imaging Components

Phase rings to generate positive or negative Zernike phase contrast images.

Phase Contrast Imaging

Image of a spiral zone plate design.

Spiral and Custom Zone Plates

Unique beam shaping and focusing applications with resolution excellence.

Custom Design Optics

Electron microscopy image of a multi focus zone plate.

Custom Design Optics

Unique applications at synchrotrons and XFELs.

Custom Design Optics

An electron microscope image of a two dimensional array for waveform sensing.

Hartmann Wavefront Sensor Plates

2D array for wavefront sensing etched deep in Si, Au, W and more.

Hartmann Wavefront Sensor Systems

Resolution Targets and
Test Patterns

Electron microscope image of a calibrated target for testing the resolution of images generated with X-ray or extreme ultraviolet light.

Siemens Star

Resolution testing with feature capability < 10 nm.

Resolution Targets

Electron microscope image of a nested L structure.

Nested “L” structure

Accurate, calibrated and reproducible for your imaging reference purposes.

Micro CT Test Targets

Electron microscope image of a standardized 1951 United States Air Force resolution test chart.

Linear and Grating Resolution Patterns

Measurements, ruling, scaling with linearly spaced Ronchi gratings.

Resolution Targets

Electron microscope image of a standardized 1951 United States Air Force resolution test chart.

1951 USAF Resolution Test Chart

Analysis and validation in images and optical engineering.

Resolution Targets

Photograph taken with a scanning electron microscope of a test target for X-ray micro computed tomography.

Micro Computed Tomography (μCT)

Test patterns with state-of-the-art accuracy.

Micro CT Test Targets

A pattern including all standard resolution targets.

Standardized Test Patterns

Compact 0.3 × 0.3 mm² test target layout with < 50 nm features and < 10 nm compatibility, ideal for very high-resolution X-Ray imaging system calibrations.

Micro CT Test Targets

Scanning electron microscope image of a three dimensional Siemens star for testing resolution.

3D Siemens Star

Accurate and high resolution structures from a variety of materials.

3D Nanostructures

Diamond Optics

A photograph of a diamond beamsplitter grating.

Diamond Beamsplitter

The highest quality and performance under the most intense radiation.

Diamond Optics

Scanning electron microscope image of a zone plate made from diamond.

Diamond Fresnel Zoneplates

Robust and durable focusing solutions at free electron laser beamlines. C. David et al., doi: 10.1038/srep00057

Diamond Optics

Diamond Resolution Test Targets

Indestructible, accurate and prescribed image resolution tests targets from diamond.

Diamond Optics

Electron microscopy image of a checkerboard grating made from diamond.

Custom Diamond Gratings

Large grating area on diamond plates with < 100 nm feature size and ∼10 μm height. Photo by T. Mamyrbayev, Paul Scherrer Institute.

Diamond Optics

Electron microscope image of a custom diffuser made of diamond for X-rays.

Diamond Custom Structures

Innovative nanofabrication solutions designed for high radiation heat loads.

Diamond Optics

Membranes and
Beamline Supplies

Image of thin membranes mounted on silicon chips.

Standard Membranes

Practical multi-frame arrays that can be cleaved easily into individual membranes.

Membranes

Photograph of silicon nitride membranes with customized membrane shapes.

Custom Membranes for Liquid Cells

Low stress standard and customized membranes and through ports on wafers for applications in photonics, X-ray sampling, nanoscale research and microfluidics.

Membranes

Photograph of silicon nitride windows in a wafer.

Coated Membranes

Expert application for vast coating materials and thicknesses with nanometer resolution.

Membranes

Photograph of silicon nitride windows in a wafer.

Membrane Wafers

High quality with low prices for a variety of wafer sizes.

Membranes

Photo of a central stop.

Central Stops

We supply the critical components of beamline design with many materials and dimensions.

Beamline Supplies, Apertures and Central Stops

Scanning electron microscope image of an array of pin holes.

Pinholes and Order Sorting Apertures

Single or array of holes and aperture elements for X-ray beam shaping and image clarity.

Beamline Supplies, Apertures and Central Stops

Scanning electron microscope image of thin silicon nanowires.

Nanowires

Ultra-thin nanowires with various sizes and positions for innovative applications.

Beamline Supplies, Apertures and Central Stops

Scanning electron microscope image of a beam shaper.

Diffusers and Beam Shapers

Fabricated to give broad and uniform illumination for cleaner X-ray imaging.

Beamline Supplies, Apertures and Central Stops

Photonics Solutions

Laser Scanning Confocal Microscopy image of an array of micrometer sized lenses all adjacent to each other.

Microlenses

High accuracy lens pitch and position for any pattern and application.

Nanophotonics and Foundry Services

Image of grayscale laser lithography.

Greyscale Fabrication

High sensitivity grayscale laser lithography.

Blazed Gratings and Greyscale Structures

Scanning electron microscope image of a grating.

Gratings

Excellence in grating fabrication and design using direct laser writing or photolithography masks.

Blazed Gratings and Greyscale Structures

Microscope image of phase rings for an X-ray imaging system.

Nano Silicon on Insulator (SOIs) Resonators

Fast and efficient, ring structure, top-notch, direct-on-chip solutions for photonics integrated circuits.

Nanophotonics and Foundry Services

Photo of a grating lithographically designed.

Nano Silicon on Insulator (SOIs) Grating Couplers

Accurate design and patterning of surface grating teeth for the best fiber coupling efficiency.

Nanophotonics and Foundry Services

A photo of a photonics integrated circuit inspected with a microscope.

Nano Silicon on Insulator (SOIs) Waveguides

Laser writing of integrated photonic circuits in both 2D and 3D.

Nanophotonics and Foundry Services

A photo of a photonic detector chip

Detector Chips

Using lithography, we develop and fabricate detector chips, sensors, and integrated circuits for your specific applications.

Nanophotonics and Foundry Services

A photo of a photonic detector chip with the logos of the two companies, XRnanotech and Swiss PIC.

Manufacturing and Integration

Photonics package solutions for excellent oversight of design and fabrication with our friends at Swiss‑PIC.

Nanophotonics and Foundry Services

Fabrication Services

Image of a silicon wafer being prepared in a cleanroom facility with an array of membranes.

Cleanroom Service

Your custom needs solved with out 1000 m² cleanroom rated up to class 10/ISO 4. State of the art lithography, etching and deposition services.

Nanophotonics and Foundry Services

Photograph of the clean room at Park Innovaare.

Tools

Over 80’000’000 CHF worth of state of the art instrumentation at our fingertips, supplying lithography, etching and deposition services. Photo by M. Teller, Park Innovaare.

Nanophotonics and Foundry Services

Photo of lithographically fabricated rings.

Lithography

Electron Beam Lithography (EBL), Direct Laser Writer (DLW), 2-Photon Polymerization (2PP) for 3D Lithography, Mask Aligner (MA), Displacement Talbot Interference Lithography (DTL).

Nanophotonics and Foundry Services

Scanning electron microscopy image of a grating with step heights.

Etching

Reactive Ion Etcher (RIE), Ion Milling (IM), Inductively Coupled Plasma Reactive Ion Etcher (ICP-RIE), Deep Reactive Ion Etcher (D-RIE), Inductively Coupled Plasma Deep Reactive Ion Etcher (ICP-D-RIE)

Nanophotonics and Foundry Services

Atomic force microscopy image of platform structures.

Plating

In house solution plating with high purity and robustness of materials.

Nanophotonics and Foundry Services

Image of coated gratings on glass

Coating

Plasma Enhanced Atomic Layer Deposition (PE-ALD), Plasma Enchanced Chemical Vapor Deposition (PE-CVD), Physical Vapor Deposition (PVD)

Nanophotonics and Foundry Services